其他產(chǎn)品及廠家
掩模的完整性對高標準光刻工藝的成功起主要作用。masktrack pro 掩膜清洗處理系統(tǒng)滿足下一代光刻節(jié)點在掩模清洗、烘烤和顯影工藝方面的所有標準。它是應對 193i 1x half-pitch dpt、紫外光刻 (euvl) 和納米壓印光刻 (nil)高要求的創(chuàng)新解決方案。以創(chuàng)新技術大限度地提高光掩模性能。
更新時間:2025-09-09
最新產(chǎn)品
- Iridin (Standard) 2025/9/25 0:41:53
- Salviaflaside (Standard) 2025/9/25 0:41:29
- Secoxyloganin (Standard) 2025/9/25 0:41:05
- Naringenin chalcone (Standard) 2025/9/25 0:40:40
- α-Arbutin (Standard) 2025/9/25 0:40:16
- Ganoderenic acid A (Standard) 2025/9/25 0:39:52
- Dehydropachymic acid (Standard) 2025/9/25 0:39:28
- Calanolide E 2025/9/25 0:39:04
- Caesalmin E 2025/9/25 0:38:40
- Ocotillone 2025/9/25 0:38:16
- Cabralealactone 2025/9/25 0:37:52
- Cabraleahydroxylactone, acetate 2025/9/25 0:37:28
- Cabraleahydroxylactone 2025/9/25 0:37:03
- Caboxine A 2025/9/25 0:36:39
- Buxbodine B 2025/9/25 0:36:15
- Bullatantriol 2025/9/25 0:35:51
- Buergerinin G 2025/9/25 0:35:27
- BR-xanthone A 2025/9/25 0:35:03
- Broussonin C 2025/9/25 0:34:39
- Broussonin B 2025/9/25 0:34:15
- Brevilin A (Standard) 2025/9/25 0:33:50
- Brachynoside heptaacetate 2025/9/25 0:33:26
- Bourjotinolone A 2025/9/25 0:33:02
- Borreriagenin 2025/9/25 0:32:38
- Borapetoside F 2025/9/25 0:32:14
- Borapetoside E 2025/9/25 0:31:50
- Borapetoside D 2025/9/25 0:31:26
- Bongardol 2025/9/25 0:31:02
- Boeravinone B (Standard) 2025/9/25 0:30:38
- Boehmenan D 2025/9/25 0:30:14